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ʻO Gallium Phosphide GaP, kahi semiconductor koʻikoʻi o nā waiwai uila kū hoʻokahi e like me nā mea hui III-V ʻē aʻe, e hoʻoheheʻe ʻia i loko o ka ʻano ZB cubic thermodynamically paʻa, he mea aniani ʻalani-melemele semitransparent me kahi ʻāpana ʻāpana ʻole o 2.26 eV (300K), ʻo ia hoʻi. synthesized mai 6N 7N gallium maʻemaʻe kiʻekiʻe a me ka phosphorus, a ulu i loko o ka aniani hoʻokahi e ka ʻenehana Liquid Encapsulated Czochralski (LEC).ʻO Gallium Phosphide crystal he sulfur a i ʻole tellurium no ka loaʻa ʻana o ka semiconductor n-type, a me ka zinc doped e like me ka conductivity p-type no ka hana hou ʻana i ka wafer i makemake ʻia, nona nā noi i ka ʻōnaehana optical, uila a me nā mea optoelectronics ʻē aʻe.Hiki ke hoʻomākaukau ʻia ka wafer Crystal GaP hoʻokahi Epi-Mākaukau no kāu noi LPE, MOCVD a me MBE epitaxial.Hiki ke hāʻawi ʻia ke kiʻekiʻe kiʻekiʻe ʻo Gallium phosphide GaP wafer p-type, n-type a undoped conductivity ma Western Minmetals (SC) Corporation i ka nui o 2″a me 3” (50mm, 75mm anawaena), orientation <100>,<111 > me ka hoʻopau ʻana i ka ʻili o ke kaʻina hana i ʻoki ʻia, poni a mākaukau epi.
Nā noi
Me ka haʻahaʻa haʻahaʻa a me ka hana kiʻekiʻe i ka hoʻokuʻu ʻana i nā kukui, ua kūpono ʻo Gallium phosphide GaP wafer no nā ʻōnaehana hōʻike optical e like me ke kumu kūʻai haʻahaʻa ʻulaʻula, ʻalani, a me ka ʻōmaʻomaʻo kukui-emitting diodes (LEDs) a me ka backlight o ka melemele a me ka ʻōmaʻomaʻo LCD etc. haʻahaʻa a haʻahaʻa haʻahaʻa, hoʻohana nui ʻia ʻo GaP ma ke ʻano he substrate kumu no nā sensor infrared a me ka nānā ʻana i nā kāmela.
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Hōʻike ʻenehana
Hiki ke hāʻawi ʻia i ka nui o 2″ a me 3” (50mm, 75mm) ke anawaena, orientation <100> ka nui o ka kristal Gallium Phosphide GaP wafer a i ʻole substrate p-type, n-type a undoped conductivity ma Western Minmetals (SC) Corporation. , <111> me ka pau 'ana o ka 'oki, lapped, etched, poli'i, epi-mākaukau i hana 'ia i loko o ka pahu wafer ho'okahi i sila 'ia i loko o ka 'eke alumina composite a i 'ole e like me ke kikoo kiko'ī i ka hopena kūpono.
ʻAʻole. | Nā mea | Kūlana Kūlana |
1 | Nui GaP | 2" |
2 | Anawaena mm | 50.8 ± 0.5 |
3 | ʻAno ulu | LEC |
4 | ʻAno Conductivity | P-type/Zn-doped, N-type/(S, Si,Te)-doped, Un-doped |
5 | Kūlana | <1 1 1> ± 0.5° |
6 | Mānoanoa μm | (300-400) ± 20 |
7 | Kū'ē Ω-cm | 0.003-0.3 |
8 | Kūlana Paʻa (OF) mm | 16±1 |
9 | Palapala Hōʻike (IF) mm | 8±1 |
10 | Hale Kaʻahele cm2/Vs min | 100 |
11 | Hoʻopaʻa ʻana i ka lawe ʻana cm-3 | (2-20) E17 |
12 | Dislocation Density cm-2max | 2.00E+05 |
13 | Hoʻopau ʻili | P/E, P/P |
14 | Hoʻopili | ʻO ka pahu wafer hoʻokahi i hoʻopaʻa ʻia i ka ʻeke alumini composite, pahu pahu ma waho |
Huahelu Linear | GaP |
Kaumaha Molekala | 100.7 |
ʻO ka hana aniani | Zinc huila |
ʻO ke ʻano | Paʻa ʻalani |
Lae hehee | N/A |
Lae paila | N/A |
ʻO ka mānoanoa ma 300K | 4.14 g/cm3 |
ʻAha ikehu | 2.26 eV |
Ke kū'ē kūʻokoʻa | N/A |
Helu CAS | 12063-98-8 |
Helu EC | 235-057-2 |
ʻO Gallium Phosphide GaP Wafer, me ka haʻahaʻa o kēia manawa a me ka hana kiʻekiʻe i ka hoʻokuʻu kukui, ua kūpono ia no nā ʻōnaehana hōʻike optical e like me ke kumu kūʻai haʻahaʻa ʻulaʻula, ʻalani, a me ka ʻōmaʻomaʻo kukui-emitting diodes (LEDs) a me ka backlight o ka melemele a me ka ʻōmaʻomaʻo LCD etc. ʻO ka mālamalama, hoʻohana nui ʻia ʻo GaP ma ke ʻano he substrate kumu no nā mea ʻike infrared a me ka nānā ʻana i nā kāmela.
Manaʻo Kūʻai
Gallium Phosphide GaP